header3

 

TechnologieProcess Description CVD

CVD (Chemical Vapour Deposition) is a process to apply thin layers of nitrides, carbides or oxides in single and/or multi-layers on various substrates.

Since CVD Coating are applied in temperatures of about 1'000°C, only few material can be coated with this method. Yet this disadvantage is more than equalized by the high surface qualities and the good adhesion.

The application of the various layer types on the substrate is done under vacuum and heat in a closed container (reactor). Gases (H2, N2, and CH4) and the precursor titanium (Titanium-Tetrachloride, TiCl4) are controlled and lead into the reactor.

By applying Aluminum-Oxide, a black very hard and corrosion resistant layer is created. Other coatings are Titanium Nitride (gold-colored), Titanium Carbide (metallic colored) and Titanium Carbonitride (violet).


 

 

 

TechnologiePossible Coatings

Titan-Nitride, Titan-Carbide, Titan-Carbonitride, Moderate-Temperature TiCN, Aluminium oxide as well as mixtures and Multi-Coatings.

Possible Substrates

Tungsten Carbide (Hardmetal) Tools, Ceramic (Silicon Nitride) and heat resistant Steel.

Applications, function of CVD Coating

Cutting tools:
Extension of lifetime, Wear-Protection, Corrosion protection, stops cold welding

Machinery (Pressing Tools, Deep Drawing Tools, wear Parts):
Extension of lifetime, Corrosion protection